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Plasma polymerization of hexamethyldisiloxane: Revisited
Author(s) -
Hegemann Dirk,
Bülbül Ezgi,
Hanselmann Barbara,
Schütz Urs,
Amberg Martin,
Gaiser Sandra
Publication year - 2021
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.202000176
Subject(s) - hexamethyldisiloxane , polymerization , plasma polymerization , plasma , monomer , activation energy , chemical physics , chemistry , electron , molecule , materials science , atomic physics , photochemistry , polymer chemistry , polymer , organic chemistry , physics , quantum mechanics
Abstract Activation reactions of molecules in plasma are investigated using plasma polymerization of hexamethyldisiloxane as a model system for plasma‐state polymerization. Underlying reaction pathways and film‐forming mechanisms are revisited based on a simplified macroscopic approach, considering the average energy available per monomer particle, E pl, in relation to the threshold energy, E th , which represents an activation barrier for plasma polymerization. Basic principles are discussed involving averaged values for collision frequency, cross‐section, and reaction rate to produce film‐forming species combining macroscopic and microscopic quantities. Considering the energy uptake from the electric field by the electrons, the energy transfer from electrons to monomer molecules, and the conversion into film‐forming species, it is demonstrated that E pl / E th is equally relevant as the electron energy distribution function for plasma‐chemical activation reactions.