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A chemical‐kinetic model of DBDs in Ar‐H 2 O mixtures
Author(s) -
Klages ClausPeter
Publication year - 2020
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.202000028
Subject(s) - kinetic energy , dissociation (chemistry) , dielectric , excited state , dielectric barrier discharge , analytical chemistry (journal) , atom (system on chip) , thermodynamics , materials science , chemistry , atomic physics , organic chemistry , physics , quantum mechanics , optoelectronics , computer science , embedded system
A simplified chemical‐kinetic model was applied to Ar‐H 2 O dielectric‐barrier discharges (DBDs), presuming that dissociation processes are only due to energy transfer from excited Ar species. Good agreement was obtained between the densities of HO, H 2 , and O 2 and experimental data from the literature, whereas a discrepancy for H 2 O 2 could not be explained. The model is useful for designing DBD reactors and process development. Steady‐state densities of H atoms increase with decreasing fractions of x H 2 Owhich should be kept below 0.1% to obtain a large zone of virtually constant and large H‐atom density in the DBD reactor, whereas the HO density is hardly affected by x H 2 O . O 2 contaminations must be kept well below 100 ppm in to attain maximum H‐atom densities.