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Inside Cover Picture: Plasma Process. Polym. 11/2019
Author(s) -
Sun GuangYu,
Li HanWei,
Sun AnBang,
Li Yuan,
Song BaiPeng,
Mu HaiBao,
Li XiaoRan,
Zhang GuanJun
Publication year - 2019
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201970024
Subject(s) - plasma , kinetic energy , capacitance , physics , atomic physics , materials science , computational physics , mechanics , electrode , nuclear physics , classical mechanics , quantum mechanics
Inside Front Cover : We establish a theoretical ground for capacitively coupled plasma (CCP) considering ion‐induced secondary electron emission (SEE) under low pressure. Plasma parameters are derived from kinetic theory including density, potential, sheath capacitance, power balance etc. Space potential is determined as a sum of time‐averaged component and oscillating component. The former is determined by emission coeffi cient and applied voltage, while the latter has limited relevance with SEE. A numerical model for quick estimation of CCP parameters is presented as well. Further details can be found in the article by Guang‐Yu Sun, Han‐Wei Li, An‐Bang Sun, Yuan Li, Bai‐Peng Song, Hai‐Bao Mu, Xiao‐Ran Li, and Guan‐Jun Zhang ( 1900093 ).