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Experiment study on etching process of graphite electrode by DC hydrogen plasma
Author(s) -
Long Lin,
Zhou Weixing,
Tang Jingfeng,
Zhou Desheng
Publication year - 2020
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201900242
Subject(s) - graphite , plasma , hydrogen , etching (microfabrication) , electrode , plasma etching , glow discharge , materials science , reactive ion etching , spark discharge , isotropic etching , analytical chemistry (journal) , chemical reaction , chemical engineering , chemistry , nanotechnology , composite material , organic chemistry , physics , layer (electronics) , quantum mechanics , engineering
DC (direct current) graphite electrodes were used to investigate the hydrogen plasma etching characteristics. Results show that the intermittent spark is marked by physical etching, whereas glow discharge is marked by chemical etching. CH 4 is the main gas product, together with the existence of C 2 H 6 , C 2 H 4 , C 3 H 8 , and C 3 H 6 . A detailed analysis of the 20‐mA glow discharge showed that the chemical reactions due to the plasma occur mainly through hydrogenation reactions on graphite defects, and different plasma action zones on the graphite also play different roles. Additionally, plasma gaseous reaction processes were analyzed through free radical reactions.