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Energetics of reactions in a dielectric barrier discharge with argon carrier gas: VIII hydrofluoromethanes
Author(s) -
Watson Sean,
Nisol Bernard,
Wertheimer Michael R.
Publication year - 2020
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201900125
Subject(s) - dielectric barrier discharge , argon , x ray photoelectron spectroscopy , analytical chemistry (journal) , plasma , molecule , dielectric , polymer , deposition (geology) , thin film , chemistry , spectroscopy , volumetric flow rate , materials science , nanotechnology , optoelectronics , organic chemistry , chemical engineering , paleontology , physics , quantum mechanics , sediment , biology , engineering
The method we have developed for understanding energetic exchanges between precursor molecules and argon (Ar) carrier gas in a dielectric barrier discharge (DBD) has much‐proven merit. The present article focuses on hydrofluoromethanes, CH x F y . The precursors (‰ concentrations) were mixed with Ar in a 20 kHz, 8 kV (peak‐to‐peak) DBD. For each compound, E m , the energy absorbed per molecule, was plotted as a function of precursor flow rate. Besides the determination of E m , we have used optical emission spectroscopy as a diagnostic of the plasma physicochemistry. The influence of chemical structure has been investigated by depositing thin plasma polymer coatings; we have measured their deposition rates and water contact angles, which have been correlated with E m values and X‐ray photoelectron spectroscopy measurements.
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