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Time‐resolved analysis of the precursor fragmentation kinetics in an hybrid PVD/PECVD dusty plasma with pulsed injection of HMDSO
Author(s) -
Garofano Vincent,
Bérard Remy,
Glad Xavier,
Joblin Christine,
Makasheva Kremena,
Stafford Luc
Publication year - 2019
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201900044
Subject(s) - hexamethyldisiloxane , dissociation (chemistry) , plasma , kinetics , plasma enhanced chemical vapor deposition , analytical chemistry (journal) , electron temperature , argon , materials science , chemistry , thin film , chromatography , nanotechnology , ion , physics , organic chemistry , quantum mechanics
Plasma sampling mass spectrometry (PSMS) has been carried out to study the fragmentation kinetics of hexamethyldisiloxane (HMDSO) in a low‐pressure, axially asymmetric argon rf discharge designed for the growth of nanocomposite thin films through a hybrid PVD/PECVD method. Experiments have been conducted with a pulsed injection of HMDSO over a 5‐s period. Plasma conditions have been chosen to favor formation and disappearance of dust occurring in cycles of a few hundred seconds. The dissociation degree of HMDSO and the relative intensities of HMDSO‐related fragments are reported and analyzed regarding these two specific time‐scales. PSMS showed that formation of dust increases HMDSO dissociation. The same result can be deduced from the particle balance equation of HMDSO using the electron density and temperature obtained from optical emission spectroscopy as the only input parameters. For HMDSO, electron‐impact dissociation is the dominant loss pathway over diffusion and recombination on the reactor walls. Small C x H y compounds and H 2 are mostly generated from surface recombination mechanisms and lost by electron‐impact dissociation.