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Characterization of the deposition behavior and changes in bonding structures of hexamethyldisiloxane and decamethylcyclopentasiloxane atmospheric plasma‐deposited films*
Author(s) -
Gilliam Mary A.,
Farhat Susan A.,
Garner Graham E.,
Stubbs Barrack P.,
Peterson Benjamin B.
Publication year - 2019
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201900024
Subject(s) - hexamethyldisiloxane , fourier transform infrared spectroscopy , analytical chemistry (journal) , x ray photoelectron spectroscopy , deposition (geology) , plasma polymerization , chemistry , trimethylsilane , materials science , monomer , plasma , polymer , optics , organic chemistry , nuclear magnetic resonance , physics , paleontology , quantum mechanics , sediment , biology
The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy‐deficient and monomer‐deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier‐transform infrared spectroscopy (FTIR) and X‐ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius‐type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.