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Cover Picture: Plasma Process. Polym. 7∕2018
Author(s) -
Kim Sung Hyun,
Kim Mac,
Lee Jae Heung,
Lee SangJin
Publication year - 2018
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201870017
Subject(s) - materials science , sputtering , layer (electronics) , composite material , plasma , polymer , barrier layer , cover (algebra) , moisture , thin film , optoelectronics , nanotechnology , mechanical engineering , physics , quantum mechanics , engineering
Back Cover: Novel moisture barrier films are fabricated via continuous roll‐to‐roll sputtering. Especially, plasma polymer fluorocarbon thin film for organic layer fabricated using CNT/PTFE composite target by mid‐frequency sputtering. The organic layer in the 2‐dyad structure heals the defects of its inorganic layer and shows good moisture barrier properties with SiN x or SiO 2 layer. This barrier film also exhibits high flexibility and water repellency. Further details can be found in the article by S.‐J. Lee et al. ( e201700221 ).