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Effects of process conditions on the chemistry of an Ar/C 2 H 2 dust‐forming plasma
Author(s) -
Denysenko Igor B.,
Wahl Erik,
Labidi Safa,
Mikikian Maxime,
Kersten Holger,
Gibert Titaϊna
Publication year - 2019
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201800209
Subject(s) - plasma , nanoparticle , acetylene , atomic physics , flux (metallurgy) , plasma chemistry , plasma parameters , electron temperature , materials science , chemistry , analytical chemistry (journal) , nanotechnology , physics , nuclear physics , metallurgy , environmental chemistry , organic chemistry
A volume‐averaged model and numerical simulations are used to clarify the effects of process conditions on the plasma chemistry and species initiating the formation of nanoparticles in an Ar/C 2 H 2 plasma. It is shown that Ar/C 2 H 2 plasmas with low electron density, moderate input flux of acetylene and an electron energy distribution function (EEDF) close to the Druyvesteyn EEDF are the most suitable for the production of carbonaceous nanoparticles. These results are verified by direct comparison with experimental data and enable to formulate recommendations for future experiments with a controlled growth of nanoparticles in chemically active plasmas.