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Pulsed plasma initiated chemical vapor deposition (PiCVD) of polymer layers − A kinetic model for the description of gas phase to surface interactions in pulsed plasma discharges
Author(s) -
Loyer François,
Bulou Simon,
Choquet Patrick,
Boscher Nicolas D.
Publication year - 2018
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201800121
Subject(s) - plasma , deposition (geology) , polymer , thin film , kinetic energy , kinetics , chemical physics , chemical vapor deposition , dielectric barrier discharge , analytical chemistry (journal) , materials science , atmospheric pressure , phase (matter) , chemistry , atmospheric pressure plasma , dielectric , nanotechnology , optoelectronics , composite material , organic chemistry , meteorology , paleontology , physics , quantum mechanics , sediment , biology
A new kinetic model for studying the growth mechanisms in ultra‐short square pulsed atmospheric‐pressure dielectric barrier discharges (AP‐DBD) is presented. Interpretation of the deposition rates yields information on the dominant mechanisms along each pulse cycle (i.e., initiation, propagation, chain‐transfer, and termination). Further investigations extracted important parameters for the understanding of free‐radical kinetics in the plasma deposition processes. Based on the thin films’ chemistry, topography, polymeric length and growth rates, the chemical and physical meaning of the calculated parameters and their impacts on the thin films’ polymeric structure are discussed.