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A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
Author(s) -
Gebhard Maximilian,
Mitschker Felix,
Hoppe Christian,
Aghaee Morteza,
Rogalla Detlef,
Creatore Mariadriana,
Grundmeier Guido,
Awakowicz Peter,
Devi Anjana
Publication year - 2018
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201700209
Subject(s) - plasma enhanced chemical vapor deposition , atomic layer deposition , polyethylene terephthalate , materials science , thin film , deposition (geology) , nanotechnology , chemical vapor deposition , plasma , chemical engineering , composite material , physics , paleontology , quantum mechanics , sediment , engineering , biology
A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiO x and SiO x C y H z obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO 2 ) or were capped by ultrathin PEALD films of Al 2 O 3 or SiO 2 . To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm −2 ) and improved barrier performance (OTR = 0.8 cm 3 m −2 day −1 ), while the PEALD capping‐route produced GBLs free of macro‐defects.