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Synthesis of SiOC:H nanoparticles by electrical discharge in hexamethyldisilazane and water
Author(s) -
Hamdan Ahmad,
Abdul Halim Rasha,
Anjum Dalaver,
Cha Min Suk
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201700089
Subject(s) - nanoparticle , microelectronics , fourier transform infrared spectroscopy , materials science , dielectric , transmission electron microscopy , chemical engineering , scanning electron microscope , spectroscopy , analytical chemistry (journal) , nanotechnology , chemistry , optoelectronics , organic chemistry , composite material , physics , quantum mechanics , engineering
Nanoparticles have unique properties and are useful in many applications. Efficient synthesis of high yields of nanoparticles remains a challenge. Here, we synthesized SiOC:H, a low‐dielectric‐constant material, by electrical discharge at the interface of hexamethyldisilazane and water. The nanoparticle production rate of our technique was ∼17 mg per minute. We used Fourier transform infrared spectroscopy, scanning and transmission electron microscopy, and X‐ray photoemission spectroscopy to characterize the synthesized material. Heating the nanoparticles to 500 °C for 2 h released hydrogen from CH x groups and evaporated volatile compounds. Our method to produce high yields of low‐dielectric‐constant nanoparticles for microelectronic applications is promising.