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Tailoring the chemistry and the nano‐architecture of organic thin films using cold plasma processes
Author(s) -
Thiry Damien,
Chauvin Adrien,
El Mel AbdelAziz,
Cardinaud Christophe,
Hamon Jonathan,
Gautron Eric,
Stephant Nicolas,
Granier Agnès,
Tessier PierreYves
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201700042
Subject(s) - plasma polymerization , plasma , nano , materials science , plasma etching , sputtering , etching (microfabrication) , thin film , plasma processing , polymer , sputter deposition , chemical engineering , nanotechnology , polymerization , layer (electronics) , composite material , quantum mechanics , physics , engineering
In this work, we report on the development of a novel approach based on three different plasma‐based processes (i.e., plasma polymerization, magnetron sputtering, and plasma etching) to fabricate nanostructured polymer thin films. Our strategy involves at first the formation of nitrogen containing plasma polymer film subsequently covered by silver nanoparticles, serving as a hard etching mask, using magnetron sputtering. Then, the exposition of the material to a complex mixture of highly reactive radicals, ions, and photons results in the structuring at the nanoscale of the functionalized plasma polymer films. It has been demonstrated that the dimension, the shape (e.g,. nano‐dome, nano‐cone, nano‐valley, inter‐connected porous network, …) and the chemical composition of the nano‐objects can be tailored by adjusting the plasma parameters in each step of our overall procedure.