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Cover Picture: Plasma Process. Polym. 9∕2016
Author(s) -
Oberbossel Gina,
Zihlmann Serge,
Roth Christian,
Rudolf von Rohr Philipp
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201670027
Subject(s) - afterglow , cover (algebra) , plasma , materials science , process (computing) , polymer , front cover , exponential function , drop (telecommunication) , composite material , polymer chemistry , mechanics , chemical engineering , process engineering , mechanical engineering , computer science , engineering , physics , nuclear physics , mathematics , operating system , mathematical analysis , gamma ray burst , astronomy
Front Cover: The time‐dependent contact angle drop during plasma afterglow activation of polymers can be described by exponential decay processes. Fitted parameters enable the comparison of different discharge configurations and therefore allow adjusting treatment conditions to process requirements. Further on, they facilitate to study the influence of experimental settings on activation process. Further details can be found in the article by G. Oberbossel et al. on page 937 .