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Cover Picture: Plasma Process. Polym. 8∕2016
Author(s) -
Gruenwald Johannes,
Fricke Katja,
Fröhlich Maik,
Kolb Jürgen F.,
Polak Martin
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201670024
Subject(s) - materials science , cover (algebra) , plasma , atmospheric pressure plasma , oxide , coating , deposition (geology) , nanotechnology , process engineering , chemical engineering , mechanical engineering , metallurgy , engineering , physics , geology , quantum mechanics , paleontology , sediment
Front Cover: Nanostructured copper oxide films can be used in a large variety of technical applications such as bioactive surface coatings, low cost solar cells, gas sensors or pseudocapacitors. This paper demonstrates the successful deposition of such films with a non‐thermal atmospheric pressure plasma source. The maximum temperature remained well below 70 °C, which, in principle, allows the coating of heat sensitive materials. Further details can be found in the article by J. Gruenwald et al. on page 766 .