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Cover Picture: Plasma Process. Polym. 7∕2016
Author(s) -
Puliyalil Harinarayanan,
Filipič Gregor,
Cvelbar Uroš
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201670021
Subject(s) - materials science , electrical conductor , plasma , plasma etching , polymer , etching (microfabrication) , layer (electronics) , composite material , cover (algebra) , electronic circuit , optoelectronics , electrical engineering , mechanical engineering , engineering , physics , quantum mechanics
Front Cover: Formation of conductive path due to surface carbonisation is one of major challenges when polymer‐containing composites are used as electrical insulators in the high voltage devices. The presence of thin surface polymer layer can cause short circuit and fire. Here, the solution of this problem is presented with an efficient method of selective Ar/O 2 plasma etching of the polymer to expose the fillers. Such surface then avoids the possibility of short circuits and fire in warm and damp conditions. Further details can be found in the article by H. Puliyalil, G. Filipič and U. Cvelbar on page 737 .