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Post‐polymerization surface segregation in thin PECVD siloxane films leading to a self‐regenerative effect
Author(s) -
Zuber Kamil,
Markanday Jonathon F.S.,
Hall Colin,
Evans Drew,
Charrault Eric,
Murphy Peter
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201600233
Subject(s) - siloxane , plasma enhanced chemical vapor deposition , wetting , plasma polymerization , materials science , polymer , polymerization , chemical engineering , coating , adhesion , contact angle , chemical vapor deposition , surface modification , polymer chemistry , deposition (geology) , thin film , composite material , nanotechnology , paleontology , sediment , engineering , biology
In this work, the post‐synthesis changes of chemistry and surface properties of the siloxane coatings synthesized via Plasma Enhanced Chemical Vapor Deposition (PECVD) are investigated. The study shows that in contrast to the volume of the siloxane coating, which undergoes oxidation and increase in crosslinking density during several days after deposition, the surface of the coating displays different effects. Further analysis shows that this is the result of short polymer fragments diffusing onto the surface, affecting wettability of the surface and adhesion. It has also been observed that these short polymer fragment may be removed and will in time replenish, giving the coatings a regenerative nature.