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Generation of non‐equilibrium condition in solution plasma discharge using low‐pass filter circuit
Author(s) -
Heo Yong Kang,
Lee Seung Hyo,
Bratescu Maria Antoaneta,
Kim Sung Min,
Lee GyoungJa,
Saito Nagahiro
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201600163
Subject(s) - materials science , plasma , filtration (mathematics) , capacitor , resistor , filter (signal processing) , electronic circuit , analytical chemistry (journal) , electron , current density , atomic physics , optoelectronics , chemistry , voltage , electrical engineering , physics , chromatography , mathematics , engineering , statistics , quantum mechanics
Solution plasma process has been researched as one of the synthetic methods of nano‐ and functional materials using plasma discharge in liquids. In this study, a low‐pass filter circuit was introduced to increase the density and temperature of electrons involved in a non‐equilibrium condition. The discharge properties of the solution plasma generated by conventional and low‐pass filter circuits were characterized and comparatively analyzed. Filtration of the MHz range current oscillations, an increase in the maximum discharge current, and a higher stability of solution plasma were obtained by simply inserting a resistor‐capacitor (RC) component in the circuit, which leads to the increases in the density and temperature of electrons.