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A Simple Model for Ion Flux‐Energy Distribution Functions in Capacitively Coupled Radio‐Frequency Plasmas Driven by Arbitrary Voltage Waveforms
Author(s) -
Schüngel Edmund,
Donkó Zoltán,
Schulze Julian
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201600117
Subject(s) - plasma , ion , waveform , capacitively coupled plasma , voltage , atomic physics , computational physics , spectrum analyzer , flux (metallurgy) , distribution function , radio frequency , energy (signal processing) , physics , materials science , inductively coupled plasma , optics , electrical engineering , quantum mechanics , metallurgy , engineering
The ion flux‐energy distribution function (IFEDF) is of crucial importance for surface processing applications of capacitively coupled radio‐frequency (CCRF) plasmas. Here, we propose a model that allows for the determination of the IFEDF in such plasmas for various gases and pressures in both symmetric and asymmetric configurations. A simplified ion density profile and a quadratic charge voltage relation for the plasma sheaths are assumed in the model, of which the performance is evaluated for single‐ as well as multi‐frequency voltage waveforms. The IFEDFs predicted by this model are compared to those obtained from PIC/MCC simulations and retarding field energy analyzer measurements. Furthermore, the development of the IFEDF shape and the ion dynamics in the plasma sheath region are discussed in detail based on the spatially and temporally resolved model data.