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Continuous‐Wave RF Plasma Polymerization of Furfuryl Methacrylate: Correlation Between Plasma and Surface Chemistry
Author(s) -
Saboohi Solmaz,
AlBataineh Sameer A.,
Safizadeh Shirazi Hanieh,
Michelmore Andrew,
Whittle Jason D.
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201600054
Subject(s) - plasma , plasma polymerization , analytical chemistry (journal) , polymerization , mass spectrometry , mass spectrum , chemistry , deposition (geology) , phase (matter) , plasma processing , materials science , polymer , organic chemistry , chromatography , nuclear physics , paleontology , physics , sediment , biology
The plasma phase of furfuryl methacrylate (FMA) and its relationship to the surface chemistry of the generated plasma coatings was investigated utilizing mass spectrometry. Positive ion mass spectra from plasma phase and plasma coatings of FMA revealed that furanylmethyl fragment (F M , 81 m / z ) has high stability and form oligomers with itself and other species in the plasma phase and on the surface. Combined with ion flux and deposition rate data, the correlation between the normalized intensities of positive fragments from the mass spectra of the neutrals and plasma coatings suggests that neutrals were a major contributor to the plasma film growth. These findings highlight the potential of plasma phase diagnostic tools to predict the chemistry of neutral and positive species, and their role in thin film deposition.