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Structural and Optical Properties of PECVD TiO 2 –SiO 2 Mixed Oxide Films for Optical Applications
Author(s) -
Li Dayu,
Elisabeth Stéphane,
Granier Agnès,
Carette Michèle,
Goullet Antoine,
Landesman JeanPierre
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201600012
Subject(s) - hexamethyldisiloxane , materials science , refractive index , oxide , amorphous solid , plasma enhanced chemical vapor deposition , band gap , analytical chemistry (journal) , grain size , phase (matter) , mixed oxide , inductively coupled plasma , thin film , plasma , nanotechnology , composite material , crystallography , chemistry , optoelectronics , metallurgy , physics , organic chemistry , chromatography , quantum mechanics
TiO 2 –SiO 2 mixed oxide films with variable compositions are deposited from oxygen/titanium tetraisopropoxide/hexamethyldisiloxane (HMDSO) inductively coupled radiofrequency plasmas at low temperature and pressure. The related structure, morphology, and optical properties are investigated. Results show that the [Si]/[Ti + Si] concentration ratio in the film is increased sharply from 0 (pure TiO 2 ) to 0.48 by adding a small amount of HMDSO. The mixed films are in amorphous phase, and the formation of TiOSi is revealed. With an increase of Si content: the columnar structure of TiO 2 disappears, the whole film seems to be homogeneous and more compact, the grain size decreases and the top surface becomes smoother; both the refractive index and extinction coefficient are decreased, while the bandgap is increased.