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Plasma Treatment of Onychomycosis
Author(s) -
Xiong Zilan,
Roe Jeffrey,
Grammer Timothy C.,
Graves David B.
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201600010
Subject(s) - dielectric barrier discharge , nail (fastener) , trichophyton rubrum , plasma , materials science , escherichia coli , microbiology and biotechnology , jet (fluid) , electrode , nanotechnology , chemistry , optoelectronics , dielectric , biology , metallurgy , physics , biochemistry , thermodynamics , antifungal , quantum mechanics , gene
We report on the use of three “cold” atmospheric plasma (CAP) devices in treating model nails that have been coated on the backside of the nail with either Escherichia coli ( E. coli ) bacteria or Trichophyton rubrum ( T. rubrum ) fungus. We tested a helium plasma jet; a surface microdischarge plasma device; and a floating electrode dielectric barrier discharge. All of the devices, acting through the model nail, showed significant log reductions of bacterial and fungal targets in several tens of minutes. CAP technology appears to offer promise as a safe, effective, and inexpensive therapy for fungal nail infection treatment.