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Cover Picture: Plasma Process. Polym. 11∕2015
Author(s) -
Kim Cheol Hwan,
Choi Woo Jin,
Cho Seong Keun,
Goshima Daiji,
Ham Dong Seok,
Kim KwangJe,
Jeong Jongkoo,
Lee Jae Heung,
Lee SangJin
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201570040
Subject(s) - materials science , indium tin oxide , refractive index , transmittance , coating , outgassing , sputter deposition , layer (electronics) , thin film , optoelectronics , sputtering , sheet resistance , composite material , optics , nanotechnology , chemistry , physics , organic chemistry
Front Cover: Structurally simple refractive‐index‐matched indium tin oxide (IM‐ITO) film is succesfully fabricated by using a pilot scale roll to roll magnetron sputtering system. This IM‐ITO film is made up of only three layers including high refractive hard coating layer, SiO 2 and ITO thin film. And we could have good quality IM‐ITO films with electric resistance of ∼ 150 Ω□ ‐1 and high transmittance of ∼ 90% after outgassing process. Further details can be found in the article by Cheol Hwan Kim et al. on page 1322 .
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