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Cover Picture: Plasma Process. Polym. 9∕2015
Author(s) -
Mitschker Felix,
Dietrich Jan,
Ozkaya Berkem,
de los Arcos Teresa,
Giner Ignacio,
Awakowicz Peter,
Grundmeier Guido
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201570033
Subject(s) - cover (algebra) , plasma , materials science , process (computing) , polymer science , chemical engineering , process engineering , polymer chemistry , computer science , engineering , mechanical engineering , physics , quantum mechanics , operating system
Front Cover: Spectroscopic investigations of plasma properties and polymer surface‐near regions reveal the oxidative degradation of polymer interface as a function of atomic oxygen fluence during deposition of silicon oxide films. The absolutely quantified atomic oxygen fluence is determined by means of optical emission spectroscopy. Self‐assembled monolayers are used to mimic an aliphatic polymer and to track the interfacial changes by PM‐IRRAS. The interface stays intact if the atomic oxygen fluence is kept below a certain value during deposition. Further details can be found in the article by Felix Mitschker et al. on page 1002 .