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Back Cover: Plasma Process. Polym. 6∕2015
Author(s) -
Hur Min,
Lee Jae Ok,
Kang Woo Seok,
Song YoungHoon
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201570024
Subject(s) - cover (algebra) , plasma , materials science , pollutant , process (computing) , chemical engineering , engineering physics , process engineering , environmental science , analytical chemistry (journal) , nanotechnology , chemistry , environmental chemistry , mechanical engineering , engineering , physics , computer science , organic chemistry , nuclear physics , operating system
Back Cover: Feasibility tests of abating and stabilizing pollutants emitted during semiconductor manufacturing were performed by using a plasma reactor placed before a vacuum pump. TEMAZ was fully destroyed, and the destroyed TEMAZ was transformed into ZrO x particles with sub 10 nm size. Detailed abatement characteristics of N 2 O, CF 4 , CHF 3 , NF 3 , C 3 H 6 , and TEMAZ can be found in the article by Min Hur et al. on page 583 .
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