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Cover Picture: Plasma Process. Polym. 1∕2015
Author(s) -
Blanchard Noémi E.,
Hanselmann Barbara,
Drosten Johannes,
Heuberger Manfred,
Hegemann Dirk
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201570001
Subject(s) - hexamethyldisiloxane , surface energy , plasma , radical , gas phase , materials science , polymer , monomer , polymer chemistry , phase (matter) , analytical chemistry (journal) , chemical engineering , chemical physics , composite material , chemistry , organic chemistry , physics , nuclear physics , engineering
Front Cover: The densification of hexamethyldisiloxane plasma polymers is governed by a complex inter‐play of gas phase and surface processes. In a regime of nearly constant ion bombardment at the surface, the fragmentation of the monomer in the gas phase is of similar importance: at low energy input into the gas phase mainly mono‐radicals are formed and deposited requiring the abstraction of a CH3 group at the surface to promote film growth. At higher energy inputs the bi‐radical is directly formed in the gas phase and the energy at the surface can be used for film densification/cross‐linking. Further details can be found in the article by Noémi E. Blanchard et. al. on page 32 .