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A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge
Author(s) -
Pokorný Petr,
Mišina Martin,
Novotný Michal,
Fitl Přemysl,
Vlček Jan,
Musil Jindřich,
Marešová Eva,
Bulíř Jiří,
Lančok Jan
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500221
Subject(s) - methane , argon , radical , analytical chemistry (journal) , ion , hydrogen , chemistry , microwave , ion source , molecule , mass spectrometry , glow discharge , plasma , materials science , environmental chemistry , organic chemistry , physics , chromatography , quantum mechanics
In this work, we focus on study of the formation and behavior of molecules, radicals, and ions in ECR discharge in a mixture of argon and methane. Discharge properties are studied at various conditions; total gas flow (0–50 sccm), absorbed microwave power (0–900 W) and the partial pressure of methane (0–1.2 Pa). Neutral mass spectrometry does not reveal the presence of radical CH 5 commonly described in literature. Spectra show the presence of atomic hydrogen H and especially H 2 molecules. The number of CH 4 + and CH 3 + species shows that the amount of CH 4 + in areas power up to 350 W is high, but with further increase of the power their amount decreases. With the increasing power the CH 3 + ions are more intensively generated. The obtained data helps optimize process conditions for the fabrication of diamond and DLC thin films.