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Effect of Substrate Temperature on Thermal Properties and Deposition Kinetics of Atmospheric Plasma Deposited Methyl(methacrylate) Films
Author(s) -
Scheltjens Gill,
Van Assche Guy,
Van Mele Bruno
Publication year - 2017
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500213
Subject(s) - differential scanning calorimetry , thermogravimetric analysis , materials science , deposition (geology) , analytical chemistry (journal) , desorption , substrate (aquarium) , arrhenius equation , plasma , plasma polymerization , chemical engineering , adsorption , chemistry , polymer chemistry , polymerization , activation energy , composite material , organic chemistry , thermodynamics , polymer , paleontology , physics , oceanography , quantum mechanics , sediment , biology , engineering , geology
The first part of this paper focuses on the chemical and thermal properties of pdMMA films, which are evaluated as a function of T substrate . Thermogravimetric analysis reveals a decreased low molecular weight fraction and enhanced cross‐link density with increasing T substrate. In accordance, an enhanced glass transition is observed with differential scanning calorimetry. In a second part, a new Arrhenius‐type empirical model is presented for the specific plasma deposition rate k 0 , i.e.,k 0 ( Y f , T ) = A app ( Y f ) ⋅ exp (− E app / ( R ⋅ T ) ) , with input plasma power and precursor feed rate (by means of the Yasuda factor, Y f ) and T of the substrate as variables of the plasma deposition process. A simplified plasma deposition mechanism is suggested based on adsorption, desorption, and surface plasma polymerization of activated species, justifying the experimental findings and empirical model.