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Thin Film Deposition on Open‐Cell Foams by Atmospheric Pressure Dielectric Barrier Discharges
Author(s) -
Fanelli Fiorenza,
Fracassi Francesco
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500150
Subject(s) - dielectric barrier discharge , materials science , x ray photoelectron spectroscopy , scanning electron microscope , polyurethane , coating , atmospheric pressure , dielectric , composite material , deposition (geology) , atmospheric pressure plasma , thin film , substrate (aquarium) , porosity , analytical chemistry (journal) , chemical engineering , plasma , nanotechnology , chemistry , optoelectronics , paleontology , oceanography , physics , quantum mechanics , sediment , engineering , biology , geology , chromatography
Thin films are deposited on open‐cell polyurethane (PU) foams using an atmospheric pressure dielectric barrier discharge (DBD) fed with helium and hexafluoropropene (C 3 F 6 ). During deposition processes, a foam substrate is sandwiched between the dielectric‐covered electrodes of a parallel plate DBD reactor, so that the discharge can ignite also inside its three‐dimensional (3D) interconnected porous structure. This affords the deposition of a fluorocarbon coating on both the exterior and interior of the foam. Scanning electron microscopy (SEM) observations allow estimating the thickness of the coating deposited on the foam struts, while X‐ray photoelectron spectroscopy (XPS) analyses show moderate changes in surface chemical composition moving from the outer to the inner surfaces of the plasma‐treated foams under all explored experimental conditions.