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Nitrogen Radical and Plasma Diagnostics in Dual Frequency Hybrid Plasmas to Investigate N 2 /SiH 4 PECVD Process
Author(s) -
Sahu Bibhuti Bhusan,
Han Jeon Geon,
Shin Kyung Sik,
Hori Masaru
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500116
Subject(s) - langmuir probe , plasma , plasma enhanced chemical vapor deposition , capacitively coupled plasma , plasma diagnostics , spectroscopy , atomic physics , analytical chemistry (journal) , radio frequency , materials science , nitrogen , chemistry , inductively coupled plasma , physics , telecommunications , computer science , chromatography , quantum mechanics , organic chemistry
The present work addresses a systematic approach for measuring the atomic nitrogen radicals using vacuum ultraviolet absorption spectroscopy (VUVAS) in the N 2 ‐SiH 4 PECVD processes using alternate plasma concepts. Measurements using VUVAS and RF compensated Langmuir probe reveal that there is significant enhancement in the radical and plasma density when the discharge is operated using the dual frequency hybrid source using the combination of a low and a very high‐frequency source. The behavior of low frequency and dual frequency capacitively coupled plasma (CCP) discharges is experimentally investigated. This study also presents a detailed analysis and effectiveness of the dual frequency hybrid plasmas for the practical applications.