Premium
Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface‐Near Regions During the Deposition of SiO x Films
Author(s) -
Mitschker Felix,
Dietrich Jan,
Ozkaya Berkem,
de los Arcos Teresa,
Giner Ignacio,
Awakowicz Peter,
Grundmeier Guido
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500085
Subject(s) - hexamethyldisiloxane , analytical chemistry (journal) , materials science , fluence , oxygen , spectroscopy , absorption spectroscopy , atomic layer deposition , monolayer , plasma , layer (electronics) , chemistry , nanotechnology , optics , ion , physics , organic chemistry , chromatography , quantum mechanics
Atomic oxygen densities and fluences in a microwave plasma are determined by means of optical emission spectroscopy for different oxygen to hexamethyldisiloxane (HMDSO) ratios during deposition of SiO x and SiO x C y H z like coatings on molecularly defined organic surfaces. The plasma coatings are deposited on octadecanethiol self‐assembled monolayers that serve as a sensor layer. They are used for tracing the interfacial changes induced during plasma deposition as a function of the O 2 to HMDSO ratio and absolutely quantified atomic oxygen fluence. The interfacial chemical changes are monitored by means of polarization modulation IR reflection‐absorption spectroscopy. The data reveal that significant oxidative degradation of the sensor layer is reached for exposure to an atomic oxygen fluence of 1.0 · 10 22 m −2 .