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Deposition of Functional Plasma Polymers Influenced by Reactor Geometry in Capacitively Coupled Discharges
Author(s) -
Hegemann Dirk,
Michlíček Miroslav,
Blanchard Noémi E.,
Schütz Urs,
Lohmann Dominik,
Vandenbossche Marianne,
Zajíčková Lenka,
Drábik Martin
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500078
Subject(s) - plasma , deposition (geology) , density functional theory , plasma polymerization , polymer , materials science , electrode , capacitively coupled plasma , thin film , surface energy , polymerization , surface modification , analytical chemistry (journal) , chemical physics , inductively coupled plasma , chemistry , nanotechnology , composite material , computational chemistry , organic chemistry , paleontology , physics , quantum mechanics , sediment , biology
The deposition of functional plasma polymers such as a‐C:H:O films is mainly influenced by fragmentation of the parent molecules in the gas phase as well as by the energetic conditions during film growth at the surface. The influence of gas phase and surface processes on the a‐C:H:O film properties was thus investigated in order to optimize cross‐linking and functional group density. The control of both conditions enables permanent functional plasma polymer films deposited within different reactor geometries (capacitively coupled symmetric vs. asymmetric at driven electrode and at grounded electrode). Comparison and up‐scaling of such plasma polymerization processes are facilitated by knowing the internal energy input into the plasma and into the growing film surface.