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A Bottom‐Up and Templateless Process for the Elaboration of Plasma‐Polymer Nanostructures
Author(s) -
Zaitsev Andrii,
PoncinEpaillard Fabienne,
Lacoste Ana,
Debarnot Dominique
Publication year - 2016
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201500014
Subject(s) - plasma , deposition (geology) , nanostructure , layer (electronics) , materials science , polymer , atomic layer deposition , polyaniline , nanotechnology , chemical engineering , analytical chemistry (journal) , chemistry , composite material , polymerization , chromatography , physics , paleontology , quantum mechanics , sediment , engineering , biology
In this paper, the transition from smooth layer to nanostructured one during plasma deposition of polyaniline is demonstrated. The deposition mechanism at low discharge power allows obtaining a smooth layer with well‐defined chemical structure while high discharge power gives a structured layer but does not preserve the monomer structure. A method giving the possibility to overcome these problems by combination of high‐ and low‐power deposition is described. Obtained layers are investigated by FT‐IR spectrometry, profilometry, and atomic force microscopy.