Back Cover: Plasma Process. Polym. 11∕2014 | Zendy

Vandenabeele Cédric | Zendy; Maurau Rémy | Zendy; Bulou Simon | Zendy; Siffer Frederic | Zendy; Gérard Mathieu | Zendy; Belmonte Thierry | Zendy; Choquet Patrick | Zendy

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Back Cover: Plasma Process. Polym. 11∕2014

Author(s) -

Vandenabeele Cédric,

Maurau Rémy,

Bulou Simon,

Siffer Frederic,

Gérard Mathieu,

Belmonte Thierry,

Choquet Patrick

Publication year - 2014

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.201470045

Subject(s) - plasma , dichloromethane , materials science , thin film , graphite , coating , deposition (geology) , chemical engineering , layer (electronics) , cover (algebra) , analytical chemistry (journal) , nanotechnology , solvent , composite material , chemistry , organic chemistry , mechanical engineering , paleontology , quantum mechanics , sediment , biology , physics , engineering

Back Cover: Organo‐chlorinated thin films are produced from dichloromethane on zinc‐plated steel wires in a continuous‐flow AP‐DBD plasma process. High quality layers can be deposited at high deposition rates. A wide range of chlorinated species are created in the Ar discharge, ranging from small volatile gaseous molecules to large‐sized PAH. An increase in the injected energy induces a decrease in hydrogen concentration in the coating that becomes closer to a graphite structure. Further details can be found in the article by Simon Bulou et. al. on page 1089 .

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