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Back Cover: Plasma Process. Polym. 11∕2014
Author(s) -
Vandenabeele Cédric,
Maurau Rémy,
Bulou Simon,
Siffer Frederic,
Gérard Mathieu,
Belmonte Thierry,
Choquet Patrick
Publication year - 2014
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201470045
Subject(s) - plasma , dichloromethane , materials science , thin film , graphite , coating , deposition (geology) , chemical engineering , layer (electronics) , cover (algebra) , analytical chemistry (journal) , nanotechnology , solvent , composite material , chemistry , organic chemistry , mechanical engineering , paleontology , quantum mechanics , sediment , biology , physics , engineering
Back Cover: Organo‐chlorinated thin films are produced from dichloromethane on zinc‐plated steel wires in a continuous‐flow AP‐DBD plasma process. High quality layers can be deposited at high deposition rates. A wide range of chlorinated species are created in the Ar discharge, ranging from small volatile gaseous molecules to large‐sized PAH. An increase in the injected energy induces a decrease in hydrogen concentration in the coating that becomes closer to a graphite structure. Further details can be found in the article by Simon Bulou et. al. on page 1089 .