Cover Picture: Plasma Process. Polym. 7∕2014 | Zendy

MorenoCouranjou Maryline | Zendy; Blondiaux Nicolas | Zendy; Pugin Raphaël | Zendy; Le Houerou Vincent | Zendy; Gauthier Christian | Zendy; Kroner Elmar | Zendy; Choquet Patrick | Zendy

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Cover Picture: Plasma Process. Polym. 7∕2014

Author(s) -

MorenoCouranjou Maryline,

Blondiaux Nicolas,

Pugin Raphaël,

Le Houerou Vincent,

Gauthier Christian,

Kroner Elmar,

Choquet Patrick

Publication year - 2014

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Reports

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.201470026

Subject(s) - polyimide , materials science , pillar , foil method , polymer , etching (microfabrication) , plasma etching , plasma , composite material , nanotechnology , layer (electronics) , polymer science , polymer chemistry , mechanical engineering , engineering , physics , quantum mechanics

Front Cover: Sub‐micrometers large polyethylene naphtalate and polyimide pillars were fabricated according to a novel bottom‐up approach combining thin polymer structuring (polymer‐demixing) and plasma etching techniques. The figure presents a SEM 30° titled view picture of a nanopatterned polyimide foil with a random pillar distribution. The pillar diameters and heights are around 430 ± 80 nm and 1600 nm, respectively. Further details can be found in the article by Maryline Moreno‐Couranjou et. al. on page 647 .

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