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Cover Picture: Plasma Process. Polym. 7∕2014
Author(s) -
MorenoCouranjou Maryline,
Blondiaux Nicolas,
Pugin Raphaël,
Le Houerou Vincent,
Gauthier Christian,
Kroner Elmar,
Choquet Patrick
Publication year - 2014
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201470026
Subject(s) - polyimide , materials science , pillar , foil method , polymer , etching (microfabrication) , plasma etching , plasma , composite material , nanotechnology , layer (electronics) , polymer science , polymer chemistry , mechanical engineering , engineering , physics , quantum mechanics
Front Cover: Sub‐micrometers large polyethylene naphtalate and polyimide pillars were fabricated according to a novel bottom‐up approach combining thin polymer structuring (polymer‐demixing) and plasma etching techniques. The figure presents a SEM 30° titled view picture of a nanopatterned polyimide foil with a random pillar distribution. The pillar diameters and heights are around 430 ± 80 nm and 1600 nm, respectively. Further details can be found in the article by Maryline Moreno‐Couranjou et. al. on page 647 .