Cover Picture: Plasma Process. Polym. 6∕2014 | Zendy

Alvarez Rafael | Zendy; GarciaMartin Jose M. | Zendy; LopezSantos Maria C. | Zendy; Rico Victor | Zendy; Ferrer Francisco J. | Zendy; Cotrino Jose | Zendy; GonzalezElipe Agustin R. | Zendy; Palmero Alberto | Zendy

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Cover Picture: Plasma Process. Polym. 6∕2014

Author(s) -

Alvarez Rafael,

GarciaMartin Jose M.,

LopezSantos Maria C.,

Rico Victor,

Ferrer Francisco J.,

Cotrino Jose,

GonzalezElipe Agustin R.,

Palmero Alberto

Publication year - 2014

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Reports

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.201470022

Subject(s) - front cover , cover (algebra) , plasma , sputter deposition , materials science , oblique case , thin film , sputtering , deposition (geology) , porosity , simple (philosophy) , cavity magnetron , front (military) , atomic physics , geometry , nanotechnology , composite material , physics , mechanical engineering , nuclear physics , engineering , mathematics , geology , meteorology , paleontology , linguistics , philosophy , sediment , epistemology

Front Cover: The deposition rate of porous thin films deposited by magnetron sputtering at oblique angles is described assuming two contributions: the incorporation of ballistic atoms and of thermalized, isotropically directed, sputtered atoms. A simple general formula is deduced and experimentally validated. Further details can be found in the article by Rafael Alvarez et. al. on page 571 .

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