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Back Cover: Plasma Process. Polym. 3∕2014
Author(s) -
Terriza Antonia,
MacíasMontero Manuel,
LópezSantos Maria C.,
Yubero Francisco,
Cotrino José,
GonzálezElipe Agustín R.
Publication year - 2014
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201470013
Subject(s) - cover (algebra) , plasma , biasing , substrate (aquarium) , materials science , carbon fibers , chemical engineering , polymer chemistry , analytical chemistry (journal) , composite material , voltage , chemistry , organic chemistry , electrical engineering , mechanical engineering , engineering , physics , oceanography , quantum mechanics , composite number , geology
Back Cover: The characteristics of fluorinated carbon films plasma deposited by using c ‐C 4 F 8 as precursor have been correlated with the plasma parameters and properties. The self‐bias voltage at the substrate and the type of intermediate species in the plasma control the composition and structure of the films from polymeric CFx to fluorinated DLC compositions. Further details can be found in the article by Agustín R. González‐Elipe et. al. on page 290 .