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Towards Roll‐to‐Roll Deposition of High Quality Moisture Barrier Films on Polymers by Atmospheric Pressure Plasma Assisted Process
Author(s) -
Starostin Sergey A.,
Creatore Mariadriana,
Bouwstra Jan B.,
van de Sanden Mauritius C. M.,
de Vries Hindrik W.
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201400194
Subject(s) - materials science , dielectric barrier discharge , atmospheric pressure , polyethylene naphthalate , tetraethyl orthosilicate , permeation , foil method , polymer , atmospheric pressure plasma , deposition (geology) , moisture , analytical chemistry (journal) , composite material , chemical engineering , dielectric , chemistry , plasma , nanotechnology , membrane , chromatography , optoelectronics , oceanography , engineering , biology , paleontology , biochemistry , quantum mechanics , physics , sediment , geology
An atmospheric pressure dielectric barrier discharge (DBD) was applied for the deposition of silica‐like moisture barrier films on polyethylene 2,6 naphthalate foil. The diffuse plasma was sustained between two cylindrical drum electrodes in N 2 /O 2 /Ar gas flow with the addition of tetraethyl orthosilicate. The chemical composition, morphology and water vapour transmission rate of the moisture permeation barrier layers were studied as a function of the dynamic deposition rate and substrate temperature. It was demonstrated that dense silica‐like layers of 100 nm thick with a good permeation barrier of ≈1.8 × 10 −3 g · m −2 · day (at 40 °C, 90% RH), corresponding to three orders of magnitude barrier improvement with respect to the pristine polymer, can be deposited in an atmospheric pressure process.