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Fabrication, Characterization, and Comparison of Oxygen‐Rich Organic Films Deposited by Plasma‐ and Vacuum‐Ultraviolet (VUV) Photo‐Polymerization
Author(s) -
Ruiz JuanCarlos,
GirardLauriault PierreLuc,
Wertheimer Michael R.
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201400146
Subject(s) - polymerization , oxygen , ultraviolet , x ray photoelectron spectroscopy , derivatization , fourier transform infrared spectroscopy , chemistry , plasma polymerization , analytical chemistry (journal) , plasma enhanced chemical vapor deposition , ethylene , limiting oxygen concentration , mass spectrometry , polymer chemistry , polymer , materials science , chemical engineering , organic chemistry , chemical vapor deposition , chromatography , catalysis , optoelectronics , engineering
Thin organic films with oxygen‐bearing functional groups (hydroxyl, carboxyl, …) were prepared by “co‐polymerizing” gas mixtures of ethylene (C 2 H 4 ) and one of several O‐containing oxidizer molecules, O 2 , CO 2 , or N 2 O. This was done either by vacuum‐ultraviolet (VUV) photo‐polymerization or by low‐pressure r.f. plasma‐assisted CVD. The gas mixture ratio, R , permits one to control total oxygen concentration, [O], as well as the relative proportions of the various functionalities. Analyses were performed by XPS (with or without chemical derivatization using TFAA to determine [OH] content), and IRRAS‐FTIR. Temporal and structural stability (mass change) of deposits under exposure to air or water was examined; altogether, data confirmed different reaction pathways for VUV and PECVD.