Premium
Inhibition of Interfacial Oxidative Degradation During SiO x Plasma Polymer Barrier Film Deposition on Model Organic Substrates
Author(s) -
Ozkaya Berkem,
Mitschker Felix,
Ozcan Ozlem,
Awakowicz Peter,
Grundmeier Guido
Publication year - 2015
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201400105
Subject(s) - monolayer , cyclic voltammetry , materials science , polymer , deposition (geology) , chemical engineering , plasma , infrared spectroscopy , analytical chemistry (journal) , thin film , electrochemistry , chemistry , nanotechnology , organic chemistry , composite material , electrode , physics , paleontology , quantum mechanics , sediment , engineering , biology
Interfacial processes during the initial stages of SiO x ‐like plasma‐polymer barrier coating deposition were investigated by means of polarization modulation infrared reflection‐absorption spectroscopy, and the resulting effect on defect densities were studied by cyclic voltammetry. Octadecanethiol self‐assembled monolayers on Au‐film coated wafers served as sensor layers to investigate interface chemistry during the plasma deposition. Both the spectroscopic and electrochemical data revealed that a thin SiOCH interlayer could reduce oxidative degradation of the SAM during subsequent deposition of the SiO x barrier film from an oxygen‐rich plasma phase. The present electrochemical investigation confirmed effective inhibition of interfacial oxidative degradation processes of an aliphatic polymer in the presence of a SiOCH interfacial layer.