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Plasma Deposition of Thermo‐Responsive Thin Films from N‐Vinylcaprolactam
Author(s) -
MorenoCouranjou Maryline,
Palumbo Fabio,
Sardella Eloisa,
Frache Gilles,
Favia Pietro,
Choquet Patrick
Publication year - 2014
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201400019
Subject(s) - thin film , x ray photoelectron spectroscopy , materials science , contact angle , plasma , deposition (geology) , oligomer , polymer , analytical chemistry (journal) , chemical engineering , nanotechnology , polymer chemistry , composite material , chemistry , organic chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology
Herein, plasma deposited thermally responsive thin polymer films from N‐vinylcaprolactam (NVCL) is reported for the first time by using a low pressure RF plasma process. While FT‐IR and XPS analyses highlight the film chemistry, ToF‐SIMS combined with MALDI‐MS analyses allow to accurately identify different oligomer distributions in the deposited film. The switching behavior of these smart surfaces is confirmed with water contact angle measurements at low and high temperatures, allowing also to estimate the Lower Critical Solution Temperature.