Premium
Plasma Process. Polym. 6/2013
Author(s) -
Hilt Florian,
Duday David,
Gherardi Nicolas,
Frache Gilles,
Bardon Julien,
Choquet Patrick
Publication year - 2013
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201370016
Subject(s) - atmospheric pressure plasma , polymer science , materials science , polyphosphate , cover (algebra) , coating , atmospheric pressure , polymer , process (computing) , plasma enhanced chemical vapor deposition , polymer chemistry , chemical engineering , plasma , process engineering , composite material , nanotechnology , chemistry , computer science , engineering , mechanical engineering , organic chemistry , physics , thin film , meteorology , nuclear physics , operating system , phosphate
Cover: An original polyphosphate‐based coating was synthesized for the first time by a PECVD process at the atmospheric pressure and the plasma polymer structure considered as a part of a new family of organophosphorus coatings was highlighted. Further details can be found in the article by Florian Hilt et al. on page 556 .