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Plasma Process. Polym. 5/2013
Author(s) -
Her E. K.,
Ko T.J.,
Shin B.,
Roh H.,
Dai W.,
Seong W. K.,
Kim H.Y.,
Lee K.R.,
Oh K. H.,
Moon M.W.
Publication year - 2013
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201370013
Subject(s) - materials science , hydrolysis , plasma , cover (algebra) , transparency (behavior) , etching (microfabrication) , solid surface , layer (electronics) , chemical engineering , polymer chemistry , composite material , chemistry , computer science , organic chemistry , mechanical engineering , engineering , physics , computer security , quantum mechanics , chemical physics
Cover: A hydrolysis reaction representing a simple and eco‐friendly method has been employed to remove the capping layer, which is a by‐product after the CF 4 plasma etching of PMMA. After the hydrolysis reaction, the hydrophobicity and transparency of the PMMA surface are improved due to the lower solid fraction value of the surface, as shown in the image on the left in the figure. The cover images is presented by Myoung‐Woon Moon et. al., and further details can be found on page 481 .