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Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water
Author(s) -
Manakhov Anton,
Zajíčková Lenka,
Eliáš Marek,
Čechal Jan,
Polčák Josef,
Hnilica Jaroslav,
Bittnerová Štěpánka,
Nečas David
Publication year - 2014
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201300177
Subject(s) - monomer , plasma polymerization , polymerization , polymer , volumetric flow rate , materials science , plasma , contact angle , chemical engineering , polymer chemistry , chemistry , analytical chemistry (journal) , organic chemistry , composite material , thermodynamics , physics , quantum mechanics , engineering
The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine‐rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W / F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the N H x environment.