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Plasma Deposition of an Organophosphorus Coating at Atmospheric Pressure
Author(s) -
Hilt Florian,
Duday David,
Gherardi Nicolas,
Frache Gilles,
Bardon Julien,
Choquet Patrick
Publication year - 2013
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201300010
Subject(s) - x ray photoelectron spectroscopy , coating , atmospheric pressure , atmospheric pressure plasma , fourier transform infrared spectroscopy , dielectric barrier discharge , analytical chemistry (journal) , monomer , scanning electron microscope , plasma polymerization , materials science , mass spectrometry , deposition (geology) , polymer , ellipsometry , chemical engineering , chemistry , plasma , dielectric , thin film , organic chemistry , composite material , nanotechnology , chromatography , optoelectronics , oceanography , engineering , biology , paleontology , quantum mechanics , physics , sediment , geology
Plasma polymerisation of an organophosphorus monomer in atmospheric pressure‐dielectric barrier discharge was studied. Phosphate‐based molecules were introduced as a vapour into a nitrogen plasma at atmospheric pressure and a phosphorus‐containing coating was obtained. Scanning electron microscopy and ellipsometry revealed the morphology of the coating while Fourier transform infrared spectroscopy and X‐ray photoelectron spectroscopy indicated a hybrid organic–inorganic coating containing phosphate, organophosphate and different N‐containing groups. The new polymer structure of the coating was highlighted by secondary ion mass spectrometry.