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Plasma Process. Polym. 7/2012
Author(s) -
Chen Zhiqiang,
Dai Xiujuan J.,
Lamb Peter R.,
de Celis Leal David R.,
Fox Bronwyn L.,
Chen Ying,
du Plessis Johan,
Field Matthew,
Wang Xungai
Publication year - 2012
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201290019
Subject(s) - materials science , process (computing) , plasma , polymer science , chemical engineering , process engineering , engineering , computer science , physics , nuclear physics , operating system
Cover: The cover shows indentation impressions by AFM for epoxy, MWCNT/epoxy, and plasma amine‐functionalized MWCNT/epoxy composites. Further details can be found in the article by J. Dai on page 733 .
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