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Plasma Process. Polym. 6/2012
Author(s) -
Schneider Simon,
Lackmann JanWilm,
Ellerweg Dirk,
Denis Benjamin,
Narberhaus Franz,
Bandow Julia E.,
Benedikt Jan
Publication year - 2012
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201290016
Subject(s) - plasma , jet (fluid) , helium , nozzle , atmospheric pressure plasma , photon , plasma channel , substrate (aquarium) , chemistry , analytical chemistry (journal) , materials science , atomic physics , optics , mechanics , physics , nuclear physics , chromatography , thermodynamics , oceanography , geology
Cover: The image shows a modified version of a micro scale He/O 2 atmospheric pressure plasma jet (μ‐APPJ) source. The so‐called X‐Jet allows separation of gaseous particles from photons in the effluent downstream of the plasma. The separation is realized in the crossed‐channel structure at the nozzle of the jet, where a direct channel (extension of the space between electrodes, where the plasma is located) is crossed by an additional side channel. A helium flow introduced through the side channel of this structure deflects all particles in the plasma effluent into the side channel. The photons, in contrast, are not affected by this additional gas flow and they can propagate undisturbed through the direct channel, which is filled by helium gas. The isolated effect of plasma generated photons or reactive radicals on any substrate placed under the channels can be examined in this way. Moreover, photochemistry reactions initiated by plasma generated photons with the gas mixture in the side channel can also be tested. Further details can be found in the article by S. Benedikt on page 561 .