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Mass Spectrometric Characterizations of Ions Generated in RF Magnetron Discharges during Sputtering of Silver in Ne, Ar, Kr an.d Xe Gases
Author(s) -
Pokorný Petr,
Novotný Michal,
Musil Jindřich,
Fitl Přemysl,
Bulíř Jiří,
Lančok Ján
Publication year - 2013
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201200145
Subject(s) - ion , cavity magnetron , sputter deposition , sputtering , atomic physics , analytical chemistry (journal) , atom (system on chip) , high power impulse magnetron sputtering , chemistry , xenon , argon , materials science , thin film , nanotechnology , physics , organic chemistry , chromatography , computer science , embedded system
The article reports mass spectrometric characterizations of ions generated in RF magnetron discharges generated using silver targets and Ne, Ar, Kr and Xe gases. Both the amount of ions and ion energies in magnetron discharges were investigated. The following ions X + , Ag + , (XAg) + , X 2 + , Ag 2 + , X ++ and Ag ++ were found in the RF discharges; here X = Ne, Ar, Kr, Xe is the inert gas atom and Ag is the silver atom. The amount of individual ions, their energies and ion energy distribution (IED) functions as a function of sputtering gas pressure were measured. It is shown that the sputtering gas pressure strongly influences the generation of ions, their amount and energy in the RF magnetron discharges. The knowledge of the energies and amounts of individual ions is of a key importance in the deposition of thin films with controlled properties using RF magnetron discharges.