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NH 2 and NH Surface Production in Pulsed NH 3 Plasmas on TiO 2 : A Steady‐State Probe of Short Pulse Plasmas
Author(s) -
Pulsipher Daniel J. V.,
Fisher Ellen R.
Publication year - 2013
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201200060
Subject(s) - plasma , analytical chemistry (journal) , nitriding , phase (matter) , afterglow , spectroscopy , duty cycle , materials science , atomic physics , chemistry , nitrogen , physics , organic chemistry , gamma ray burst , chromatography , quantum mechanics , astronomy , power (physics)
Understanding the gas‐phase and surface chemistry of NH x species in pulsed NH 3 plasmas can lead to optimized plasma conditions for nitriding metal oxide surfaces such as TiO 2 . Gas‐phase densities and surface reactions of NH and NH 2 in pulsed NH 3 plasmas used to nitride TiO 2 surfaces were explored by systematically varying peak plasma power and pulsing duty cycle. Results from laser induced fluorescence and optical emission spectroscopy studies reveal interconnected trends of gas‐phase densities and surface reactions. Divergent trends in NH, NH 2 H α , H γ , N 2 + , and N densities found in short pulse plasmas are explained by plasma pulse initiation and afterglow effects. NH 2 and NH surface scatter coefficients were measured with the imaging of radicals interacting with surfaces technique as a function of plasma parameters, including pulse sequence. Results show NH x species primarily scatter off of TiO 2 and are correlated to NH gas phase densities.