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The Effect of O 2 in a Humid O 2 /N 2 /NO x Gas Mixture on NO x and N 2 O Remediation by an Atmospheric Pressure Dielectric Barrier Discharge
Author(s) -
Teodoru Steluta,
Kusano Yukihiro,
Bogaerts Annemie
Publication year - 2012
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.201100187
Subject(s) - environmental remediation , excited state , analytical chemistry (journal) , raw material , dielectric , atmospheric pressure , radical , materials science , chemistry , atomic physics , physics , environmental chemistry , optoelectronics , organic chemistry , ecology , contamination , meteorology , biology
A numerical model for N x O y remediation in humid air plasma produced with a dielectric barrier discharge at atmospheric pressure is presented. Special emphasis is given to NO 2 and N 2 O reduction with the decrease of O 2 content in the feedstock gas. A detailed reaction mechanism including electronic and ionic processes, as well as the contribution of radicals and excited atomic/molecular species is proposed. The temporal evolution of the densities of NO, NO 2 and N 2 O species, and some other by‐products, is analyzed, and the major pathways for the N x O y remediation are discussed for one pulse. Subsequently, simulations are presented for a multi‐pulses case, where three O 2 contents are tested for optimization of the remediation process. It is found that when the gas mixture O 2 /N 2 /H 2 O/NO x has no initial O 2 content, the best NO x and N 2 O remediation is achieved.